Cathodoluminescence Characterization of Point Defects Generated through Ion Implantations in 4H-SiC
نویسندگان
چکیده
The high quality of crystal growth and advanced fabrication technology silicon carbide (SiC) in power electronics enables the control optically active defects SiC, such as vacancies (VSi). In this paper, VSi are generated hexagonal SiC (4H) samples through ion implantation nitrogen or (and) aluminum, respectively n- p-type dopants for SiC. presence within is studied using cathodoluminescence at 80K. For 4H-SiC samples, ZPL (zero phonon line) V1′ center more intense than one V1 before annealing. opposite true after 900 °C ZPLs divacancy defect (VCVSi) also visible
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ژورنال
عنوان ژورنال: Coatings
سال: 2023
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings13060992